(Annual Meeting
Sunday, Nov 1, 2026
La Casita Del Arroyo, Pasadena
11:30-1:30
featuring Afternoon Tea*
Historical Fashion Presentation with Natalie Meyer
Our All Chapter gathering for *lunch, vendors, election of officers, and Opportunity Drawing!
Sunday, Nov 1, 2026
La Casita Del Arroyo, Pasadena
11:30-1:30
featuring Afternoon Tea*
Historical Fashion Presentation with Natalie Meyer
Our All Chapter gathering for *lunch, vendors, election of officers, and Opportunity Drawing!
One-Day Mini Retreat
August 22, 2026
9 AM - 9 PM
$75 members
$100 non-members
Sign Up HERE!
2027 ASGLA SEWING RETREAT
FEBRUARY 18-21, 2027
Mary & Joseph Retreat Center
Rancho Palos Verdes
3 nights shared room $465 each, single $600
2 nights shared room $345, single $430
non ASG members add $60
DAYTRIPPER 9am-9pm Friday/Saturday only
$70 ASG members $100 non-members
overnight sign-ups coming soon!
The Mary & Joseph Retreat Center
overlooking Los Angeles from its beautiful location on top of
Rancho Palos Verdes
overlooking Los Angeles from its beautiful location on top of
Rancho Palos Verdes
PaTTernHack
PaTTernHack, an innovative business in the LA Arts District
Owner, Catina Ferraine, professional patternmaker, designer and couture-level stitcher with over 30 years of experience, spoke at our 2025 Annual Meeting on the future of patterns and sewing through the lens of emerging technologies
CLICK HERE FOR A VIDEO OVERVIEW OF HER PRESENTATION
From Scan to Studio
PaTTernHack transforms 3D body scans into precise digital avatars and physical fitting forms — the foundation for every accurate pattern.
PaTTernHack, an innovative business in the LA Arts District
Owner, Catina Ferraine, professional patternmaker, designer and couture-level stitcher with over 30 years of experience, spoke at our 2025 Annual Meeting on the future of patterns and sewing through the lens of emerging technologies
CLICK HERE FOR A VIDEO OVERVIEW OF HER PRESENTATION
From Scan to Studio
PaTTernHack transforms 3D body scans into precise digital avatars and physical fitting forms — the foundation for every accurate pattern.














